NEC develops atomic holography technology that can manipulate atomic images into animation-like movies

 Tokyo 19 May 00 NEC researchers, together with Professor Fujio Shimizu of the University of Electro-Communications, have developed an "atomic beam movie," a new atomic holography technology that can manipulate atomic images in animation-like movies, for the first time in the world. NEC is looking to integrate the use of atom beam lasers with the results of the research to take further steps toward the development of production technologies enabling the use of both aluminum (Al) and germanium (Ge) circuitry in nanometer-level ultra LSIs and quantum devices of the future, that will avoid increased changes of mask patterns and steps required with conventional technology.

Atomic holography is a technique that forms atomic images by using the interference of atomic matter waves passing through a holographic film. This new technology stems from the proposal of an electric-field-modulated atomic holograph that can alter atomic images by using the electric field on the holographic film, and the proposal of a holographic film with comb-shaped electrodes to modulate the electric field on the film, together with the development of fabrication technology for this new hologram film that avoids critical damage to the film during the fabrication process.

Using the electric-field-modulated atomic holograph, researchers have been able to manipulate atomic images in real time much like an animated movie. The technology will be useful for fabricating ultra-fine patterns in complex three-dimensional shapes, because the formation of such structures is difficult to achieve using conventional lithography techniques.

Together with Professor Fujio Shimizu from the University of Electro-Communications, NEC researchers set out to overcome the barriers of current process technology by creating a new technological concept. By doing so, they have established the world's first electric-field-modulated atomic holograph by demonstrating a real-time charge between two kanji characters formed with neon (Ne) atoms, by manipulating voltages applied to the holographic film.

Enormous strides have been made in refining process technologies to ever finer degrees, while semiconductors have seen ever higher levels of integration and leaps in performance as the electronics industry sees remarkable advances in technology. Current process technology in the industry is beginning to reach the 0.15-micron level but the path forward to deeper integration is only getting stronger and moves to implement 0.10-micron or nanometer (one billionth of a meter) level processes are underway. The advent of such ultra integration will see the introduction of structures utilizing the quantum effect in quantum devices, and make the development of nano-manufacturing technologies indispensable.

Currently, photo-lithograhy and other forms of photolithographic etching technologies are being developed but these face serious issues in scaling to nanometer-level production. Among these issues is the limitation of the wavelength of light to 100nm or greater, making it increasingly difficult to manufacture devices with complex structures without adding an overwhelming number of processes during manufacturing.

NEC and the University of Electro-Communications began their joint research in 1995 and believe their important breakthrough will both enable significant advances in engineering and hold a deep importance for science.

 

Ad Emmen

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